Name: Gr2 Pure Titanium Disc Forged
Brand: Jmyun
SKU: 167860826

Products Description

Gr2 Pure Titanium Disc Forged:

1. From the material: titanium target zinc target chromium target These targets are mainly used for the preparation of metal film or alloy film.

2. In terms of use: tool plating, decorative plating

3.Classification by morphology:
Flat target: A target with a flat surface, which is the most common target morphology.
Rotating target: A target that can rotate during sputtering, which helps to uniformly sputter and extend the service life of the target.
Tubular target: A target with a tubular structure, used to prepare tubular thin films or coatings with special morphology.

Products Size

Label number	GR1, GR2, GR5, GR7, GR11.
Supply specifications	Φ60, Φ65, Φ95, Φ100
Thickness	30mm/32mm/40mm/45mm
Processing Technology	Forging, rolling
Forged Surface	Car light, chamfering. The surface is smooth and flawless

Products Process

Gr2 Pure Titanium Disc Forged target material is mainly prepared by melting and casting processes

The core of the sputtering target production process is to use a high-energy ion beam to plate the ions emitted from the surface of the metal target onto the substrate to form a metal film.

The first stage: raw material preparation. The preparation process of sputtering targets uses high-purity metals as raw materials. The raw materials need to undergo multiple chemical purification processes to meet the high purity requirements. The purity of the metal must reach more than 99.99%, and other impurities and gases such as impurities and oxides need to be removed.
The second stage: target material preparation. Target material preparation is the core process of the sputtering target production process. The preparation of the target requires the use of a metal electrolytic plate with high surface quality, and it is made into a uniform, dense and compact metal target through a special process. This requires first heating the raw material to a high temperature, and at a special temperature and pressure, the metal is separated into a gaseous state through plasma treatment. Subsequently, the gaseous metal is deposited on the surface of the target by various methods to form a dense metal film.
The third stage: target material processing. At this stage, the target needs to be cut, polished, drilled, and processed for secondary processing. These preparations can be completed before or after processing to ensure the accuracy and integrity of the target. In addition, the target needs to be strictly inspected and tested to ensure that its quality meets the requirements.

target Process

Products Working Principle

The working principle of the Gr2 Pure Titanium Disc Forged is mainly based on the sputtering coating technology.
The principle of target sputtering process is to use high-speed charged particles to bombard the target material, and obtain different film systems through the interaction of different lasers (ion beams) and different target materials, achieving the functions of conductivity and blocking.
Specifically, the target sputtering process utilizes ions generated by an ion source to aggregate and accelerate in vacuum. The resulting high-speed ion beam is then used to bombard the surface of the target, causing kinetic energy exchange and allowing atoms on the target surface to deposit on the substrate surface. A target material consists of a "target blank" and a "back plate". The target blank is made of high-purity metal and is the target of high-speed ion beam bombardment. The back plate is connected to the target blank through welding technology to fix it, and it needs to have thermal and electrical conductivity.

Products Features

Gr2 Pure Titanium Disc Forged the surface roughness Ra of the inner and outer surfaces shall not be greater than 12.5μm(when ultrasonic inspection is required on the outer circumferential surface.

Gr2 Pure Titanium Disc Forged surface should not crack, fold, heavy skin and other visible defects. Local surface defects are allowed to be removed by grinding, and the cleaning depth shall not exceed the size tolerance, and the minimum allowable size shall be guaranteed. The ratio of cleaning depth to width should be no more than 1:6 on the two ends, and no more than 1:10 on the inner and outer sides.

Gr2 Pure Titanium Disc Forged Surface finish: clean, dust-free, better acid resistance service life.

Products Application

Ultra-high purity metal sputtering targets are functional materials with high added value in the production process of flat panel displays. They can ensure the uniformity of large-area film layers in the manufacturing process of flat panel displays.
In the field of solar cells, the target is mainly used in thin-film solar cells, crystalline silicon solar cells, etc.

Titanium targets and rings are used in the 130-5nm process and are used in conjunction with ultra-high purity titanium targets. Their main function is to achieve better thin film performance to meet higher integration requirements.

target application