Name: Pure Titanium Target
Brand: Jmyun
SKU: 159039758

titanium alloy target

Products Description

Metal targets are an important material used in thin film preparation processes such as physical coating and chemical vapor deposition. Metal targets are usually made of high-purity metals and are uniform, dense, non-porous and pure, and can be used to prepare high-quality thin films. The company produces high-quality metal sputtering targets. Common metals include copper, silver, gold, aluminum, nickel, titanium, etc., as well as their alloy targets.

Titanium Sputtering Targets
High purity titanium target
PVD sputtering target
PVD color plating
Size: 100*45mm/100*54
Customizable according to drawings
Purity: 99.5%, 99.95%, 99.98%, 99.995%.

titanium suptter target

Products Size

Grade

Titanium (Gr1, Gr2, Gr5, Gr7,GR12)

Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc

Proportion(wt%) 5-80 ± 0.2Ti at your request.

Titanium content ≥99.5 (%)

Impurity content <0.04(%)

Density:4.51 or 4.50 g/cm3

Standard:ASTM B348 , ASTM B381

Size

1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;

2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm

3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm

4. Customized is available

Technique:Forged and CNC Machined

titanium sputtering target

Physical Property

The microstructure uniformity of titanium slabs produced by vacuum consumable arc furnace melting + forging method and electron beam melting method was compared, and the microstructure and properties of the plates after annealing at different temperatures were studied. The results show that the slabs produced by this method have uniform microstructure, and after rolling and keeping at 700℃ for 30 min, and air cooling annealing, the grain size and performance are well matched, and both meet the requirements of titanium plates for target materials.

Grade	Tensile strength Rm/MPa(>=)	Yield strength Rp0.2(MPa)	Elongation A4D(%)	Reduction of area Z(%)
GR1	240	138	24	30
GR2	345	275	20	30
GR3	450	380	18	30
GR4	550	483	15	25

titanium pvd target

Physical Process

Titanium Target Production process

The Pure Titanium Target metal prepared by vacuum smelting process has fine grain size, less impurity content and purer purity, so as to ensure the uniformity of the material.

There are many methods for preparing target materials, including melting and casting, powder metallurgy, chemical vapor deposition (CVD), physical vapor deposition (PVD), electrochemical deposition, and powder metallurgy-hot pressing, etc. The choice of these methods depends on the material, composition and required properties of the target material.

Products Features

Pure Titanium Target material is the target material bombarded by high-speed energetic particles. When lasers with different power densities, different output waveforms, and different wavelengths interact with different target materials, different killing and destructive effects will be produced. The main metal targets used for sputtering in physical coating are:

PVD Titanium Target

Products Application

Pure titanium target
PVD sputtering target
1. Semiconductor industry:
Used to manufacture interface layers, soldering films, barrier layers, etc. in semiconductor devices to deposit metal films on silicon wafers to connect electronic elements to form circuits
2. Optical industry:
Used to manufacture films with anti-reflection, wear resistance and oxidation protection properties
Applications include eyeglass coatings, camera lens elements, telescopes, microscopes and other precision instruments
3. Flat panel display manufacturing
Used to manufacture thin films for flat panel displays such as liquid crystal displays (LCDs), plasma displays (PDPs), electroluminescent displays (ELs) and field emission displays (FEDs)
4. Photovoltaic industry:
Tungsten-titanium targets are ideal for third-generation solar cells as barrier layers for photovoltaic cells8.
5. Other high-tech fields:
Including home decoration, automotive glass manufacturing, etc., used for surface panel displays, decoration and glass coating, etc.
6. Aerospace and automobile manufacturing:
Used to manufacture high-temperature resistant parts and materials, helping to reduce structural weight and improve energy efficiency
7. Chemical and marine engineering
Titanium targets are widely used in chemical and marine engineering fields due to their excellent corrosion resistance.